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  • Characteristic Requirements of Molybdenum Sputtering Target

    In the electronics industry, molybdenum sputtering targets are widely used in flat panel displays, electrodes and thin film solar cells based on molybdenum’s high melting point, high conductivity, low specific impedance, good corrosion resistance and good environmental performance.

    2021-10-13
  • Tungsten Sputtering Targets

    Tungsten target is also called tungsten sputtering target. It is a product made of pure tungsten powder. Its appearance is silver-white. Because of its excellent physical and chemical properties, it is popular in many fields.

    2021-06-17
  • RF Sputtering of Molybdenum Target

    With the development of modern electronic technology, the requirements for film-forming quality of semiconductor devices are getting higher and higher, thus promoting the progress of vacuum deposition technology, of which RF sputtering is a better film-forming method.

    2020-05-27
  • Ultra-high-purity Tungsten Metal Sputtering Target

    In the past five years, the contribution rate of China's scientific and technological progress to GDP has increased from 52.2% in 2012 to 57.5%, and the global ranking of national innovation capacity has risen from 20th to 17th. Mechanisms, talents, and finances, like finely-woven neural networks an

    2018-03-13

sputtering target

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  • [Product News] Characteristic Requirements of Molybdenum Sputtering Target

    In the electronics industry, molybdenum sputtering targets are widely used in flat panel displays, electrodes and thin film solar cells based on molybdenum’s high melting point, high conductivity, low specific impedance, good corrosion resistance and good environmental performance.

  • [Product News] Tungsten Sputtering Targets

    Tungsten target is also called tungsten sputtering target. It is a product made of pure tungsten powder. Its appearance is silver-white. Because of its excellent physical and chemical properties, it is popular in many fields.

  • [Product News] RF Sputtering of Molybdenum Target

    With the development of modern electronic technology, the requirements for film-forming quality of semiconductor devices are getting higher and higher, thus promoting the progress of vacuum deposition technology, of which RF sputtering is a better film-forming method.

  • [Product News] Ultra-high-purity Tungsten Metal Sputtering Target

    In the past five years, the contribution rate of China's scientific and technological progress to GDP has increased from 52.2% in 2012 to 57.5%, and the global ranking of national innovation capacity has risen from 20th to 17th. Mechanisms, talents, and finances, like finely-woven neural networks an

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