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Molybdenum Sputtering Target

Molybdenum sputtering targets are mainly used in plasma sputtering industry. With the electric field, electron is collided with the argon atom when fly to the substrate, then argon atoms and electrics are ionized. The electrics fly to the substrate while argon atoms accelerate to bomb the target, the neutral atoms (or molecules) in the target deposit on the substrate and become the coating.
  • Customized
  • FOTMA
  • Purity: > 99.95%
  • Size: Customized
  • Application: Plasma sputtering
  • Tolerance: +/- 0.05mm
Quantity:

Molybdenum target is mainly used in plasma sputtering industry. With the electric field, electron collided with the argon atom when fly to the substrate, then argon atoms and electrics were ionized .The electrics fly to the substrate while argon atoms accelerate to bomb the target, the neutral atoms (or molecules) in the target deposit on the substrate and become the coating.


Since the molybdenum resistant to high temperature and corrosion, molybdenum targets are widely used in petroleum chemical industry, aviation, machine manufacturing, and electronics semiconductor industries and so on.


We provide molybdenum target that made with molybdenum powder which purity is 99.95%. High quality products have been made after decades of procedures such as pressing, sintering, rolling, cutting and surface grinding. Super sputtering target (single heavy reach to 120kg) is available at present.

 

Molybdenum Sputtering Target Description:

 

Appearance: silver white metal luster
Purity: Mo≥99.95%
Density: not less than 10.1g/cm3
Supply state: Surface polishing, CNC machine processing
Quality standard: GB/T 3876-2007( molybdenum & molybdenum alloy plate)

 

Sizes Of Molybdenum Target:

 

Planar target: 2mm-30mm thickness , up to 600mm width, up to 1800mm length

 

Rotary target: 170mm outer diameter, 1500mm length

 

Disc and Rod: up to 300mm diameter

 

 

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